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Measuring Division
Equipment Division
Injection Division
 
Equipment Division
OLED 박막분석용 엘립소미터
FF-UVISEL with MWL63ch
Brand  : HORIBA
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No

Item

Specification

1

Model

FF-UVISEL with MWL63ch

2

Measurement sample

Glass substrate

3

Measurement performance

NIST (or VLSI) standard sample 사용.

1 mm 직경 pinhole 사용. Sample수동 셋팅.

1) NIST (or VLSI) sample 사양

-. Film 재질 :  SiO2(Approx. 100 nm)

-. Thickness    :  Error must be +/- 0.5 nm

2) Repeatability accuracy

Monochrometer and Multi-Channel

sample wafer의 동일 point를 동일 시스템에서 10회 연속 측정하며, repeatability accuracy3σ define된다.

Film thickness (3σ):

0.25% or less (Using NIST or VLSI 100nm)

Refractive index(3σ):

1.0% or less (Using NIST or VLSI 100nm)

3) Absolute accuracy

sample wafer의 동일 point를 동일 시스템에서 10회 연속 측정하며, absolute accuracy는 평균으로 define된다.

Film thickness:

within +/-2.0% for guaranteed thickness by NIST (or VLSI)

 

Remarks:

1)  NIST (or VLSI) sample은 오염되지 말 것.

2)  MonochormeterMWL Performance 차이는 guarantee item 에 포함되지 않는다.

4

Wavelength

Standard :  210 nm - 880 nm

5

Incident angle

Standard :  60 degree (fixed)

6

Spot Size

1)      Approx. 1 mm x 2mm:

2)      Approx. 500μm x  500μm

7

Spectrometer

1) Monochrometer type : Wavelength 210 - 880 nm (M-200)

2) Multi-channel type  : Wavelength 210 - 880 nm

(MWL SCAN) 63Ch

 

Remarks

MWL spec. 63 ch. base로 한다.

WavelengtheV base 32로 나누어 진다.

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